Nanosurface Fabrication of Hard Brittle Materials by Structured Tool Imprinting

[+] Author and Article Information
Masahiko Yoshino, Sivanandam Aravindan

Department of Mechanical and Control Engineering, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguroku, Tokyo 152-8552, Japan

J. Manuf. Sci. Eng 126(4), 760-765 (Feb 04, 2005) (6 pages) doi:10.1115/1.1813474 History: Received April 01, 2004; Revised August 01, 2004; Online February 04, 2005
Copyright © 2004 by ASME
Your Session has timed out. Please sign back in to continue.


Timp, G., 1999, Nano Technology, Springer Verlag, New York.
Blake,  P. N., 1990, “Ductile Regime Machining of Germanium and Silicon,” J. Am. Ceram. Soc., 73(4), pp. 949–957.
Yoshino,  M., Aoki,  T., and Shirakashi,  T., 2001, “Scratching Test of Hard-Brittle Materials Under High Hydrostatic Pressure,” ASME J. Manuf. Sci. Eng., 123(2), pp. 231–239.
Yan,  J., Yoshino,  M., Kuriagawa,  T., Shirakashi,  T., Syoji,  K., and Komanduri,  R., 2001, “On the Ductile Machining of Silicon for Micro Electro-Mechanical (MEMS), Opto-Electronic and Optical Applications,” Mater. Sci. Eng., A, 297, pp. 230–234.
Nakao,  M., 2002, “Nanoprinting Technology,” IEICE Trans. Commun., J85-C(9), pp. 793–802.
Hirai,  Y., Kanagaguki,  K., Yamguchi,  T., Yao,  K., Kitagawa,  S., and Tanaka,  Y., 2003, “Fine Pattern Fabrication on Glass Surface by Imprint Lithography,” Microelectron. Eng., 67–68, pp. 237–234.
Ramanthan,  D., and Molian,  P. A., 2002, “Micro- and Sub-Micormachining of Type II a Single Crystal Diamond Using a Ti:Sapphire Femtosecond Laser,” ASME J. Manuf. Sci. Eng., 124(2), pp. 389–396.
De Chiffre,  L., Kunzmann,  H., Peggs,  G. N., and Lucca,  D. A., 2003, “Surfaces in Precision Engineering, Microengineering and Nanotechnology,” CIRP Ann., 52(2), pp. 561–577.
Yoshino, M., Aravindan, S., and Fujii, N., 2004, “Nano Forming of Glasses by Indentation,” Trans. JSME 7-696, pp. 368–374.
Aravindan, S., Yoshino, M., and Fujii, N., 2003, “Nano Indentation of Hard Brittle Materials,” Proc. JSPE Spring, p. 57.
Hayashi,  K., Tsujimoto,  S., Okamoto,  Y., and Nishikawa,  T., 1991, “Fracture Toughness of Single Crystal Silicon,” J. Soc. Mater. Sci. Jpn., 40(451), pp. 405–410.
David, Tabor., 1985, “Indentatiuon Hardness and Its Measurements: Some Cautionery Comments,” Microindentation Techniques in Materials Science and Engineering, P. J. Blau and B. R. Lawn (eds.) ASTM, Philadelphia.
Uzan-saguy,  C., Cytermann,  C., Brener,  R., Richter,  V., Shaanan,  M., and Kalish,  R., 1995, “Damage Threshold for Ion Beam Induced Graphitization of Diamond,” Appl. Phys. Lett., 67(9), pp. 1194–1196.
Hamada,  M., Teraji,  T., and Ito,  T., 2003, “Field-Induced Effects of Implanted Ga on High Electric Field Diamond Devices by Focused Ion Beam,” Appl. Surf. Sci., 216, pp. 65–71.
Stanishevsky,  A., 2001, “Patterning of Diamond and Amorphous Carbon Films Using Focussed Ion Beams,” Thin Solid Films, 398–399, pp. 560–565.
Puttick,  K. E., Rudman,  M. R., Smith,  K. J., Franks,  A., and Lindsey,  K., 1989, “Single-Point Diamond Machining of Glasses,” Proc. R. Soc. London, Ser. A, 426, pp. 19–30.
Puttick,  K. E., Shahid,  M. A., and Hosseini,  M. M., 1979, “Size Effects in Abrasion of Brittle Materials,” J. Phys. D, 12, pp. 195–202.
Puttick,  K. E., 1979, “Energy Scaling, Size Effects and Ductile-Brittle Transitions in Fracture,” J. Phys. D, 12, pp. L19–L23.
Kocks, U. F., Tome, C. N., and Wenk, H. K., 1998, Texture and Anisotropy, Cambridge University Press, UK.
Yang, W., and Lee, W. B., 1993, Mesoplasticity and its applications, Springer, New York.
Yoshino,  M., Aoki,  T., Chandrasekaran,  N., Shirakashi,  T., and Komanduri,  R., 2001, “Finite Element Simulation of Plane Strain Plastic-Elastic Indentation on Single Crystal Silicon,” J. Mech. Sci.,43, pp. 313–333.
Barber, J. R., 1992, Elasticity, Kluwer, Dordrecht.


Grahic Jump Location
Nano indentation tester
Grahic Jump Location
Structured diamond tool
Grahic Jump Location
Typical ultra fine structure made on soda glass
Grahic Jump Location
SEM image of a structure on soda glass at high magnification (indentation load 4.0 N)
Grahic Jump Location
Cross section of structures on soda glass imprinted by the stamp tool
Grahic Jump Location
SEM micrographs of structures imprinted on several hard brittle materials
Grahic Jump Location
Load-depth analysis of imprinted structures on the border region
Grahic Jump Location
Relationship between critical depth and KICy ratio
Grahic Jump Location
Load-depth analysis of imprinted structures on the central region
Grahic Jump Location
Calculated normal stress distribution for a flat tool indentation
Grahic Jump Location
Load/depth relationship in indentation and retraction process of a fine structure imprinting
Grahic Jump Location
Variation of depth ratio against the yield stress ratio



Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging and repositioning the boxes below.

Related Journal Articles
Related eBook Content
Topic Collections

Sorry! You do not have access to this content. For assistance or to subscribe, please contact us:

  • TELEPHONE: 1-800-843-2763 (Toll-free in the USA)
  • EMAIL: asmedigitalcollection@asme.org
Sign In