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Research Papers

Modeling of Thin-Film Single and Multilayer Nanosecond Pulsed Laser Processing

[+] Author and Article Information
Adrian H. A. Lutey

Dipartimento di Ingegneria Industriale,
Università di Bologna,
Bologna 40126, Italy
e-mail: adrian.lutey2@unibo.it

Manuscript received March 29, 2013; final manuscript received September 13, 2013; published online November 5, 2013. Assoc. Editor: Yung Shin.

J. Manuf. Sci. Eng 135(6), 061003 (Nov 05, 2013) (8 pages) Paper No: MANU-13-1115; doi: 10.1115/1.4025494 History: Received March 29, 2013; Revised September 13, 2013

A complete model of nanosecond pulsed laser scribing of arbitrary thin multilayer structures is presented. The chain of events is separated according to time-scale; an initial simulation considers material response during the pulse; another combines this result with the much slower effects of heat flow away from the laser axis. The former considers heating, vaporization and phase explosion of metals in the course of a single pulse, accounting for variations in thermal conductivity and optical absorption as the material becomes superheated and approaches its critical temperature. The latter calculates the bidimensional heat flow in a complete multilayer structure over the course of a scribing operation, combining material properties and considering removal by both short-pulse ablation and long-term heating of the work piece. Simulation results for the single pulse ablation of an aluminum target align well with published experimental data both in terms of phase-explosion threshold and ablation depth as a function of fluence. Bidimensional heat flow simulations of a polypropylene–aluminum–polypropylene triplex structure reveal the progression of events toward steady state behavior; aluminum ejected due to short-pulse ablation and plastic removed due to conduction.

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Figures

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Fig. 1

(a) Aluminum electrical and thermal conductivities and (b) real and imaginary parts of refractive index at 1064 nm from 298 K to 6030 K

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Fig. 2

Temperature distribution of aluminum subject to a 5 ns, 1064 nm pulse of 20 J/cm2

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Fig. 3

Ablation depth of aluminum as a function of fluence for single pulses of 1064 nm, 5 ns

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Fig. 4

Ablation depth of aluminum as a function of fluence for single pulses of 515 nm, 10 ns

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Fig. 5

(a) Temperature distribution, (b) layer states and (c) layer thicknesses of Triplex after 0.5 ms of laser exposure at 50 mm/s

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Fig. 6

(a) Temperature distribution, (b) layer states and (c) layer thicknesses of Triplex after 5 ms of laser exposure at 50 mm/s

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Fig. 7

Cut widths of aluminum and polypropylene layers of Triplex as functions of pulse energy for pulses of 515 nm, 10 ns with repetition rate 30 kHz and waist radius 15 μm at scribing velocity 50 mm/s

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