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Research Papers

Magnetic Field-Assisted Finishing of Silicon Microelectromechanical Systems Micropore X-Ray Optics

[+] Author and Article Information
Raul E. Riveros1

Department of Mechanical and Aerospace Engineering,  University of Florida, Gainesville, FL 32611pigup@ufl.edu

Hitomi Yamaguchi, Taylor Boggs

Department of Mechanical and Aerospace Engineering,  University of Florida, Gainesville, FL 32611

Ikuyuki Mitsuishi, Kazuhisa Mitsuda

 Institute of Space and Astronautical Science,  Japan Aerospace Exploration Agency, 3-1-1 Yoshinodai, Sagamihara, Kanagawa 229-8510, Japan

Utako Takagi, Yuichiro Ezoe, Kensuke Ishizu, Teppei Moriyama

Department of Physics,  Tokyo Metropolitan University, 1-1 Minami-Osawa, Hachioji-shi, Tokyo 192-0397, Japan

1

Corresponding author.

J. Manuf. Sci. Eng 134(5), 051001 (Aug 20, 2012) (7 pages) doi:10.1115/1.4006967 History: Received March 03, 2011; Accepted May 21, 2012; Published August 20, 2012; Online August 20, 2012

An alternating magnetic field assisted finishing (MAF) technique has been developed to finish the 5–20 μm wide pore sidewalls of micropore X-ray focusing optics fabricated using microelectromechanical systems (MEMS) techniques. To understand the material removal mechanism, this MAF technique is used to finish a silicon MEMS micropore X-ray optic that had previously undergone a hydrogen annealing treatment. Compared to the unfinished surface, distinctive surface features are observed on the finished surfaces using scanning electron microscopy, optical profilometry, and atomic force microscopy (AFM). This demonstrates the finishing characteristics and reveals material removal on the nanometer scale. Moreover, the representative unfinished and finished micropore sidewall surfaces show a reduction in roughness due to finishing from 1.72 to 0.18 nm Rq.

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Copyright © 2012 by American Society of Mechanical Engineers
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Figures

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Figure 1

Schematic of the processing principle

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Figure 2

(a) Photograph of experimental setup and (b) a schematic of pole tip

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Figure 3

Mirror chip (a) schematic and (b) photograph

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Figure 4

FE-SEM images of micropores. Before MAF: (a), (c), (e), and (g), after MAF: (b), (d), (f), and (h).

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Figure 5

Representative surface shapes measured by optical profiler after (a) DRIE, (b) hydrogen annealing, (c) hydrogen annealing + MAF

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Figure 6

Comparison of surface profiles

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Figure 7

Measured surface roughness (a) Rz, (b) Rq, (c) RSm, and (d) Rsk using a 100 μm sampling length

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Figure 8

AFM images of micropore sidewalls after (i) DRIE, (ii) hydrogen annealing, and (iii) hydrogen annealing + MAF

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Figure 9

Measured values of Rz with surface conditions

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Figure 10

Measured values of Rq with surface conditions

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