Surface Finishing and Evaluation of Three-Dimensional Silicon Microchannel Using Magnetorheological Fluid

[+] Author and Article Information
Wook-Bae Kim, Seung-Hwan Lee, Byung-Kwon Min

School of Mechanical Engineering, Yonsei University, 134 Shinchon, Seodaemun, Seoul 120-749, Korea

J. Manuf. Sci. Eng 126(4), 772-778 (Feb 04, 2005) (7 pages) doi:10.1115/1.1811113 History: Received February 01, 2004; Revised June 28, 2004; Online February 04, 2005
Copyright © 2004 by ASME
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Ehmann, K. F., DeVor, R. E., Kapoor, S. G., and Ni, J., 2000, Proc. Micro/Meso-Mechanical Manufacturing, An NSF Sponsored Workshop, Evanston, IL.
Bean,  K. E., 1978, “Anisotropic Etching of Silicon,” IEEE Trans. Electron Devices, 25, pp. 1185–1193.
Sato,  K., Shikida,  M., Yamashiro,  T., Tsunekawa,  M., and Ito,  S., 1999, “Roughening of Single-Crystal Silicon Surface Etched by KOH Water Solution,” Sens. Actuators, A, 73, pp. 122–130.
Findler, G., Muchow, J., Koch, M., and Munzel, H., 1992, “Temporal Evolution of Silicon Surface Roughness During Anisotropic Etching Processes,” Proc. Micro Electro Mechanical System ’92, Travemunde, IEEE, New York, pp. 62–66.
Campbell,  S. A., Cooper,  K., Dixon,  L., Earwaker,  R., Port,  S. N., and Schiffrin,  D. J., 1995, “Inhibition of Pyramid Formation in the Etching of Si p〈100〉 in Aqueous Potassium Hydroxide-Isopropanol,” J. Micromech. Microeng., 5, pp. 2019–218.
Gad-el-Hak, M., 2002, The MEMS Handbook, CRC Press, Boca Raton, Chap. 19.
Kang,  S. W., Chen,  J. S., and Hung,  J. Y., 1998, “Surface Roughness of (110) Orientation Silicon Based Micro Heat Exchanger Channel,” Int. J. Mach. Tools Manuf., 38(5–6), pp. 663–668.
Park,  J. H., Baek,  C. W., Jung,  S., and Kim,  H. T., 2000, “Novel Micromachined Coplanar Waveguide Transmission Lines for Application in Millimeter-Wave Circuits,” Jpn. J. Appl. Phys., 39, pp. 7120–7124.
Klumpp,  A., Kuhl,  K., Schabe,  U., Kaufl,  H. U., and Lang,  W., 1995, “Anisotropic Etching for Optical Gratings,” Sens. Actuators, A, 51, pp. 77–80.
Li,  Y., Chen,  D., and Yang,  C., 2001, “Sub-Microns Period Grating Couplers Fabricated by Silicon Mold,” Opt. Laser Technol., 33, pp. 623–626.
Chou,  S. Y., Krauss,  P. R., and Renstrom,  P. J., 1996, “Nanoimprint Lithography,” J. Vac. Sci. Technol., 14(6), pp. 4129–4133.
Hu,  Y., Werner,  C., and Li,  D., 2003, “Influence of Three-Dimensional Roughness on Pressure-Driven Flow Through Micro Channels,” ASME J. Fluids Eng., 125, pp. 871–879.
Ge, J., McDavitt, D., Bernecker, J., Miller, S., Ciarlo, D., and Kuzmenko, P., 2002, “Development of Silicon Grisms and Immersion Gratings for High Resolution Infrared Spectroscopy,” Proc. SPIE, Bellingham WA, Vol. 4485, Allen, M. L. et al., eds., pp. 393–405.
Romanofsky, R. R., Bhasin, K. B., Ponchak, G. E., Downey, A. N., and Connolly, D. J., 1985, “An Experimental Investigation of Microstrip Properties on Soft Substrate From 2 to 40GHz,” IEEE MTT-S Digest 85 (1), pp. 675–678.
Wu,  H. Y., and Cheng,  P., 2003, “An Experimental Study of Convective Heat Transfer in Silicon Micro Channels With Different Surface Conditions,” Int. J. Heat Mass Transfer, 46, pp. 2547–2556.
Shinmura,  T., and Yamaguchi,  H., 1993, “Study on a New Internal Finishing Process by Applying Magnetic Abrasive Machining (Internal Finishing of Stainless Steel Tubings and Clean Gas Bombs),” Trans. Jpn. Soc. Mech. Eng., Ser. C, 59(560), pp. 1261–1267.
Yamaguchi,  H., Shinmura,  T., and Kuga,  K., 1995, “New Internal Finishing Process Applying Magnetic Abrasive Machining (5th Report, Effects of Magnetic Abrasive Behavior on Finishing Characteristics),” Trans. Jpn. Soc. Mech. Eng., Ser. C, 62(600), pp. 3313–3319.
Yamaguchi,  H., and Shinmura,  T., 1999, “Study of the Surface Modification Resulting from an Internal Magnetic Abrasive Finishing Process,” Wear, 225–229, pp. 246–255.
Childs,  T. H. C., and Yoon,  H. J., 1992, “Magnetic Fluid Grinding Cell Design,” CIRP Ann., 41(1), pp. 343–347.
Umehara,  N., and Komanduri,  R., 1996, “Magnetic Fluid Grinding of HIP-Si3N4 Rollers,” Wear, 192, pp. 85–93.
Umehara,  N., Kato,  K., Mizuguchi,  S., and Nakamura,  S., 1994, “Micro Surface Polishing Using Magnetic Fluid in Local Area,” J. Jpn. Soc. Precis. Eng., 60(11), pp. 1606–1610.
Umehara,  N., Kato,  K., and Watanabe,  J., 1989, “Magnetic Fluid Gridning (3rd Report, Grinding Properties of a Cylinder with a Float),” J. Jpn. Soc. Mech. Eng., 58(554), pp. 3134–3139.
Kordonski,  W., and Golini,  D., 1999, “Progress Update in Magnetorheological Finishing,” Int. J. Mod. Phys. B, 13, pp. 2205–2212.
Kordonski, W., and Jacobs, S. D., 1995, “Magnetorheological Finishing,” Proc. 5th Int. Conf. ER Fluids & MR Suspensions, Sheffield, W.A. Bullogh, ed., World Scientific, Singapore, pp. 1–12.
Shorey, A. B., 2000, “Mechanisms of Material Removal in Magnetorheological Finishing (MRF) of Glass,” Ph.D. thesis, University of Rochester, New York.
Larson, R. G., 1999, The Structure and Rheology of Complex Fluids, Oxford University Press, New York, Chap. 8.
Lord Corporation, MRF-240BS Data Sheet.
Rosenweig, R. E., 1985, Ferrohydrodynamics, Dover, New York, Chap. 5.
Qu,  W., Mala,  M. G., and Li,  D., 2000, “Heat Transfer for Water Flow in Trapezoidal Silicon Micro Channels,” Int. J. Heat Mass Transfer, 43, pp. 3925–3936.
Wu,  H. Y., and Cheng,  P., 2003, “An Experimental Study of Convective Heat Transfer in Silicon Micro Channels With Different Surface Conditions,” Int. J. Heat Mass Transfer, 46, pp. 2547–2556.


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Cross section of microchannels by wet etching in 〈100〉 silicon wafer
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Optical microscope image (×50) and SEM image (×100) of channel surface: (a) before finishing, (b) after finishing, and (c) edge between bottom surface and side wall before finishing, and (d) after finishing
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Optical 3D profiler images for etched bottom surface: (a) Before finishing: Ra 52.0 nm, Rp-v 382.2 nm; (b) After finishing: Ra 11.1 nm; Rp-v 88.4 nm
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SEM image of carbonyl iron particles
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Optical 3D profiler images for etched side surface: (a) before finishing: Ra 184.6 nm, Rp-v 1.14 μm; (b) After finishing: Ra 18.1 nm; Rp-v 126.4 nm
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Optical 3D profiler images of top surface before finishing: (a) before finishing: Ra 0.32 nm, Rp-v 1.87 nm; and (b) after finishing: Ra 1.87 nm; Rp-v 9.77 nm
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Silicon microchannels measured by an optical 3D surface profiler
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Roughness of bottom surface and channel height with respect to finishing time
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Roughness of bottom surface and channel height with respect to the magnet rotational speed
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Roughness of bottom surface and channel height with respect to the gap distance between the magnet and the specimen
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Fabricated single trapezoidal silicon microchannel
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Schematic diagram of experimental system to measure pressure drop through microchannels
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Measured pressure drops through unpolished and polished microchannel
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(a) Schematic of finishing process for microchannels; (b) experimental setup
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Magnetic flux lines, field intensity map, and relative direction of field gradient around magnet generated by MAXWELL simulation



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