0
TECHNICAL PAPERS

Surface Finishing and Evaluation of Three-Dimensional Silicon Microchannel Using Magnetorheological Fluid

[+] Author and Article Information
Wook-Bae Kim, Seung-Hwan Lee, Byung-Kwon Min

School of Mechanical Engineering, Yonsei University, 134 Shinchon, Seodaemun, Seoul 120-749, Korea

J. Manuf. Sci. Eng 126(4), 772-778 (Feb 04, 2005) (7 pages) doi:10.1115/1.1811113 History: Received February 01, 2004; Revised June 28, 2004; Online February 04, 2005
Copyright © 2004 by ASME
Your Session has timed out. Please sign back in to continue.

References

Figures

Grahic Jump Location
SEM image of carbonyl iron particles
Grahic Jump Location
(a) Schematic of finishing process for microchannels; (b) experimental setup
Grahic Jump Location
Magnetic flux lines, field intensity map, and relative direction of field gradient around magnet generated by MAXWELL simulation
Grahic Jump Location
Cross section of microchannels by wet etching in 〈100〉 silicon wafer
Grahic Jump Location
Optical microscope image (×50) and SEM image (×100) of channel surface: (a) before finishing, (b) after finishing, and (c) edge between bottom surface and side wall before finishing, and (d) after finishing
Grahic Jump Location
Optical 3D profiler images for etched bottom surface: (a) Before finishing: Ra 52.0 nm, Rp-v 382.2 nm; (b) After finishing: Ra 11.1 nm; Rp-v 88.4 nm
Grahic Jump Location
Optical 3D profiler images for etched side surface: (a) before finishing: Ra 184.6 nm, Rp-v 1.14 μm; (b) After finishing: Ra 18.1 nm; Rp-v 126.4 nm
Grahic Jump Location
Optical 3D profiler images of top surface before finishing: (a) before finishing: Ra 0.32 nm, Rp-v 1.87 nm; and (b) after finishing: Ra 1.87 nm; Rp-v 9.77 nm
Grahic Jump Location
Silicon microchannels measured by an optical 3D surface profiler
Grahic Jump Location
Roughness of bottom surface and channel height with respect to finishing time
Grahic Jump Location
Roughness of bottom surface and channel height with respect to the magnet rotational speed
Grahic Jump Location
Roughness of bottom surface and channel height with respect to the gap distance between the magnet and the specimen
Grahic Jump Location
Fabricated single trapezoidal silicon microchannel
Grahic Jump Location
Schematic diagram of experimental system to measure pressure drop through microchannels
Grahic Jump Location
Measured pressure drops through unpolished and polished microchannel

Tables

Errata

Discussions

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging and repositioning the boxes below.

Related Journal Articles
Related eBook Content
Topic Collections

Sorry! You do not have access to this content. For assistance or to subscribe, please contact us:

  • TELEPHONE: 1-800-843-2763 (Toll-free in the USA)
  • EMAIL: asmedigitalcollection@asme.org
Sign In