Surface Finishing and Evaluation of Three-Dimensional Silicon Microchannel Using Magnetorheological Fluid

[+] Author and Article Information
Wook-Bae Kim, Seung-Hwan Lee, Byung-Kwon Min

School of Mechanical Engineering, Yonsei University, 134 Shinchon, Seodaemun, Seoul 120-749, Korea

J. Manuf. Sci. Eng 126(4), 772-778 (Feb 04, 2005) (7 pages) doi:10.1115/1.1811113 History: Received February 01, 2004; Revised June 28, 2004; Online February 04, 2005
Copyright © 2004 by ASME
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SEM image of carbonyl iron particles
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(a) Schematic of finishing process for microchannels; (b) experimental setup
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Magnetic flux lines, field intensity map, and relative direction of field gradient around magnet generated by MAXWELL simulation
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Cross section of microchannels by wet etching in 〈100〉 silicon wafer
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Optical microscope image (×50) and SEM image (×100) of channel surface: (a) before finishing, (b) after finishing, and (c) edge between bottom surface and side wall before finishing, and (d) after finishing
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Optical 3D profiler images for etched bottom surface: (a) Before finishing: Ra 52.0 nm, Rp-v 382.2 nm; (b) After finishing: Ra 11.1 nm; Rp-v 88.4 nm
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Optical 3D profiler images for etched side surface: (a) before finishing: Ra 184.6 nm, Rp-v 1.14 μm; (b) After finishing: Ra 18.1 nm; Rp-v 126.4 nm
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Optical 3D profiler images of top surface before finishing: (a) before finishing: Ra 0.32 nm, Rp-v 1.87 nm; and (b) after finishing: Ra 1.87 nm; Rp-v 9.77 nm
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Silicon microchannels measured by an optical 3D surface profiler
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Roughness of bottom surface and channel height with respect to finishing time
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Roughness of bottom surface and channel height with respect to the magnet rotational speed
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Roughness of bottom surface and channel height with respect to the gap distance between the magnet and the specimen
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Fabricated single trapezoidal silicon microchannel
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Schematic diagram of experimental system to measure pressure drop through microchannels
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Measured pressure drops through unpolished and polished microchannel




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